Materials research Laboratory
Visiting address: Vesilinnantie 5, Quantum (campus area map, T7), P-floor
Mail address: Department of Physics, 20014 TURUN YLIOPISTO
Fax: +358-(0)2-333 6254
We are using synchrotron radiation based photoelectron spectroscopy for studies in fundamental science, and atomic force microscopy and scanning tunnelling microscopy for applied physics research. Two research groups are committed to this research at the Department of Physics, focusing in both fundamental and applied physics.
Research in experimental physics carried out at the Department of Physics by the two groups makes use of the ultra-high vacuum environment, where the base pressure is only 0. 000 000 000 000 1 times the pressure of ambient air. Furthermore, the groups carry out high-resolution spectroscopy at MAX-Lab (Lund University, Sweden), where the only synchrotron in the Nordic countries is situated. Computational materials science makes use of the supercomputing resources at the Finnish IT center for science (CSC).
The group of Materials Science (prof. Edwin Kukk, adjunct prof. Jarkko Leiro) studies the properties of solid surfaces, modifications of surfaces, surface reactions and coatings. The aim of the interdisciplinar research is to illuminate the characteristics of the materials needed in industrial processes and technological appliances. In the field on fundamental physics research the group focuses on synchrotron radiation based gas-phase spectroscopy and instrumentation.
The group of Materials Physics (prof. Kalevi Kokko). Research topics include materials, surfaces, interfaces and thin films, their composition, atomic structure and electronic structure and effects of these properties on the physical and chemical properties of materials. The research is related to the problems encountered in metals, electronics and chemical industry. The recent PhD theses deal with instrumentation of inverse photoelectron spectroscopy, atomic and electronic structure of silicon and compound semiconductors, properties of nanoparticles with catalytic activity, and electrochemical oxidation of silicon carbide.